年次大会
Online ISSN : 2424-2667
ISSN-L : 2424-2667
セッションID: S2110103
会議情報
S2110103 平成26年特許法等の改正とその影響に関する考察([S211]技術革新を促進するための社会制度,法工学専門会議)
加藤 浩
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会議録・要旨集 フリー

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抄録
Patent Act, Design Act and Trademark Act were revised on April 25, 2014. These revisions include important provisions, and the objective of these revisions is establishment of the environment for realizing "Intellectual Property based nation" in the next ten years in Japan. The background of these revisions is that the intellectual property strategy is considered to be one of the most important issues in the innovation policy which is being proceeded by Japanese government. Patent Act was revised to introduce "Opposition System". Design Act was revised to introduce "International Registration System". Trademark Act was revised to introduce new types of Trademarks such as sound, color, etc. In this report, these revisions are explained, and the effects on the industry are discussed.
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© 2014 一般社団法人 日本機械学会
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