The Proceedings of Mechanical Engineering Congress, Japan
Online ISSN : 2424-2667
ISSN-L : 2424-2667
2015
Session ID : G1300105
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G1300105 Relationship between Polishing Characteristics of Pads and Pumping Effect of Slurry
Yu ZhangYasuhiro TaniYuji KawahataOkiharu Kirino
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
Various kinds of polishing pads have been utilized for polishing glasses, Si wafers, etc. In this paper, authors focus on the pumping effect of slurry in the pores of polishing pads. For improving the pumping effect of slurry, the vertical hole-structure pads were developed, which were made by epoxy resin. It was known that fluorine treatment on the inner wall of vertical holes could improve the pumping effect of slurry and raise removal rate of workpiece. Comparing to the nonwoven fabric polishing pad impregnated urethane or epoxy resin, the 2-step impregnated nonwoven fabric pad can improve the pumping effect of slurry and raise the number of polishing abrasive grains greatly. As the result, it was clarified that the polishing characteristics of pads are influenced by the pumping effect of slurry.
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© 2015 The Japan Society of Mechanical Engineers
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