抄録
The scattering behavior of water molecules on silicon(100) surface was investigated by the molecular beam experiment and molecular dynamics (MD) simulation. We changed the incident energy between 35 and 130 meV which corresponds to the energy of thermal motion of gas molecules at the room temperature, and measured the scattering distribution and the mean translational energy of scattered molecules in each scattering angle. The experimental results indicated that the scattering distribution was diffusive and close to that of the cosine scattering due to the roughness of the silicon surface when the incident energy was 130 meV. Generally, incident molecules would accommodate with a surface when the incident energy is low. That is because the incident molecules would interact with atoms on surface longer. However, when the incident energy was 35 meV, the scattering distribution had a directivity toward a certain angle close to the specular reflection angle. In order to investigate the reason of this directivity, we are analyzing the motion of water molecules on the silicon surface using MD method.
