抄録
The demand for ultra precise positioning of nanometer-order is increasing with the progress of nanotechnology in semiconductor industry. Previously we developed the one axis stage driven by pneumatic bellows for such a demand, and realized ultra precise positioning and long stroke. However, not only a one axis stage, but also a stage with multiple degrees of freedom is often demanded in semiconductor industry. Previously, we proposed to unitize a pneumatic bellows and an elastic hinge guide, and developed 3 degree-of-freedom fine motion stage using proposed three actuator units. However positioning accuracy of this stage is not clear up to now. In this paper, positioning accuracy of this stage is examined. As a result, positioning accuracy was 0.03±6.98[nm] or less at both settling and tracking control. It is confirmed that the fine motion stage driven by pneumatic bellows has good positioning accuracy.
