Host: The Japan Society of Mechanical Engineers
Name : [in Japanese]
Date : September 05, 2021 - September 08, 2021
The dewetting process of a liquid film is important for circuit fabrication using the surface-selective coating method, which is one of the methods to realize printed electronics. In this study, reflection interference contrast microscopy was employed to observe the three-dimensional shape of a liquid film during dewetting process. Pure water and silver nanoparticle ink were barcoated on substrates with different wettability patterns. We classified dewetting processes into two modes: successful patterning, in which a liquid film splits along the hydrophilic region, and unsuccessful patterning, in which adjacent hydrohilic regions were covered with a continuous liquid film, and sorted out which mode occurs depending on the width of the hydrophilic and hydrophobic regions.
