a-C:H交互多層膜を被覆したSi微小構造体の引張強度特性

抄録

Tensile strength of a single-crystal silicon (SCS) microstructure with an alternating hydrogenated amorphous carbon (a-C:H) coating was investigated to explore the enhancement to the coating−substrate system. All sides of the SCS microstructure were coated uniformly with a 300-nm-thick a-C:H film deposited by plasma enhanced chemical vapor deposition (PECVD). Four different single layer thickness (λ) of 25, 37.5, 75, and 150 nm were deposited. The tensile strength of a-C:H coated microstructure was investigated by a quasi-static tensile test, which showed a significant increase for samples with a multilayer alternating coating and a maximum of ~37.8% (4.34 GPa) improvement was found for a λ of 75 nm as compared with the bare SCS sample (3.15 GPa).