抄録
The residual stress in TiN film was measured by the X-ray method. TiN film was deposited on steel substrate by ion beam mixing method and the thickness was 1μm. The residual stress in TiN film was equi-biaxial and the value was about -5.5GPa compression. When uniaxial tensile loading was applied to the substrate, the stress in the film was in the biaxial state of stress because of the mismatch of Poisson's ratio. The result agreed well with the prediction. When the measured stress in the film becomes tension, the stress stop increasing even though the applied strain keep increasing. This leveling of the stress was caused by cracking of the film.