We have prepared hard (Ti,B)N thin films by Ion mixing and Vapor Deposition (IVD) technique. The structure of the films was analyzed by X-ray diffraction (XRD) and X-ray Absorption Fine Structure (XAFS) analysis using synchrotron radiation. The hardest film was obtained at the evaporation ratio B/Ti of 0.3. The film consists of TiN crystal and certain kind of boron compound such as TiB_2.
