抄録
In this work, we attempt to develop the lubritious and hard films based on TiB_<2+α> for cutting of Ti (titanium) alloys. In the experiment, we have prepared the TiB_2 and TiB_<2+α> thin films by DC magnetron sputtering using TiB_2 and TiB_2+10wt%B targets. We controlled the Ar gas flow rate and the base pressure to improve the mechanical properties of the TiB_<2+α> films. The TiB_<2+α> films having high hardness more than SOGPa were able to be obtained under the low base pressure. And the TiB_<2+α> thin films showed the high critical load almost equal to TiN films. Moreover, at the optimized coating condition, the TiB_<2+α> films were produced on tungsten carbide cutting tools. And turning tests were carried out against Ti alloys by using the high speed precision lathe.
