抄録
In order to raise the adhesion resistance up to the value of SKD11 substrate having Vickers hardness of HV450, the thin hard films of TiN, CrN, TiAlN and the multiple layers thin hard film consisted of TiN and TiAlN are deposited. The mechanical properties of thin hard coating film deposited on SKD11 substrate using are ion plating PVD process are measured by the scratch test, micro-hardness test and profile meter. The experiments are carried out to create thin hard coating on substrate by the arc ion PVD process. The critical normal force is measured by the scratch test. The obtained results are as follows. The 51st layered with TiN-TiAlN coating have been improved critical normal force higher than single TiN coating. The highest value of critical normal force is obtained on the 51st layered coating with TiN-TiAlN and Ti intermediate film for SKD11 with HV450.