抄録
In this paper, we propose a new stereolithography process using a thin film transistor (TFT) liquid crystal display (LCD) mask. Simultaneous exposure based on dynamically controlled cure process enables precise fabrication of 3D structures with the size of submillimeter order. Two types of dynamically controlled cure process such as intermittent mode and continuous mode are developed. This method is realized by optimizing exposure conditions for cure depth control based on a working curve. Fundamental experiments were performed to verify the proposed method. Both a micro-pyramid and micro-gear can be fabricated using intermittent mode. Moreover, continuous mode makes it possible to fabricate a small object with overhang shape.
