Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
2003
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PW-06 VIBRATION ISOLATION SYSTEM FOR SEMI-CONDUCTOR LITHOGRAPH MACHINE
Masato TAKAHASHISusumu MAKINOUCHI
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CONFERENCE PROCEEDINGS FREE ACCESS

Pages 305-306

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Abstract
In order to increase vibration rejection ratio for semi -conductor lithograph machines, we developed serial active vibration isolation system in which two isolation systems placed in series. Each isolation system is composed by air mount and VCM (voice coil motor). This report shows optimization of mechanics and control for serial isolation system.
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© 2003 The Japan Society of Mechanical Engineers
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