Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
2003
会議情報
CM-02 BANDING REDUCTION IN ELECTROPHOTOGRAPHIC PROCESSES THROUGH SPATITAL-SAMPLED LINEAR PARAMETER VARYING REPETITIVE CONTROL
Cheng Lun CHENGeorge T. C. CHIU
著者情報
会議録・要旨集 フリー

p. 313-314

詳細
抄録
An improved controller design and implementation technique for electrophotographic process (EP) was proposed. The new controller was modified from a previous design to address two additional issues for generic EP platforms, i.e. reducing position-dependent disturbances and reducing system sensitivity to manufacturing variations in EP engine and consumables. To handle position-dependent periodic disturbances, a digital repetitive controller was developed and implemented using spatial sampling. Second, system variations due to manufacturing variations as well as consumable changes were incorporated into the design of a two degree of freedom (TDOF) robust controller. The controller is optimal in the sense that it minimizes the size of the sensitivity function from a set of disturbance signals to a set of measurable signals critical to print quality. Trade-offs between system performance and robustness to system modeling uncertainties was considered in the synthesis and optimization formulation. The effectiveness of the proposed controller design and implementation technique was numerically and experimentally verified.
著者関連情報
© 2003 The Japan Society of Mechanical Engineers
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