Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
セッションID: MCH-10
会議情報
MCH-10 HANDLING CHARACTERISTICS OF MEMS-TWEEZERS WITH CONTACT SURFACE FABRICATED BY ICP DRY ETCHING(Micro/Nanomechatronics IV,Technical Program of Oral Presentations)
Satomitsu IMAITadashi ISHIKAWAMasakazu SATOHiroki SATOKeisuke TAMURA
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We studied methods for enhancing handling stability of micro-tweezers in terms of tribology. Two items were examined experimentally. One is a method for increasing coefficient of friction on contact surface of the microtweezers. The other is whether making handling force large leads to increase of frictional force in the case of flexible structures like micro-tweezers. As for the coefficient of friction, we put focus on surface roughness of the contact surface processed by DEEP-RIE (ICP etching). We find that coefficient of friction become large by optimizing the surface roughness. As for relation between the frictional force and the handling force, we found that the both were approximately proportional. We think that the handling stability is improved by those methods.
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© 2009 一般社団法人 日本機械学会
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