Proceedings of JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment : IIP/ISPS joint MIPE
Online ISSN : 2424-3132
セッションID: TuC-1-1
会議情報
TuC-1-1 OPTIMIZED ABERRATION COMPENSATION FOR DIGITAL HOLOGRAPHY USING DUAL MASK
Sungbin JeonDo-Hyung KimGeon LimNo-Cheol Park
著者情報
会議録・要旨集 認証あり

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抄録
We propose the optimization method for aberration compensation in digital holography using 2D Zernike fitting. Although the least square regression approach shows effective result, it requires heavy cost of performance. The proposed method applies additional random mask for selecting background specimen, so the calculation time could be reduced maintaining quality. To confirm the effectiveness both qualitative and quantitative analysis are conducted.
著者関連情報
© 2015 一般社団法人 日本機械学会
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