抄録
Ni-Mn-In films containing cobalt were deposited on a poly-vinyl alcohol (PVA) substrate or an alumina substrate using a dual magnetron sputtering apparatus using Ni45Mn4oInisand Co targets. The RF power for Ni-Mn-In target was kept at 200 W, and the DC power for the cobalt target was changed from 0 to 15 W. The thickness of the deposited films was kept at about 1 μm. After deposition, the films were annealed at 1123 K for 3.6 ks. The cobalt concentration of the films depended on the DC sputtered power and the martensitic transformation temperature decreased with cobalt concentration of films. After heat treatment, the films showed the good crystalline order. The mechanical properties of the films were measured by a nanoindentation method. Hardness and elastic modulus of the heat-treated films were lower than those of as-deposited films. These values of the films were affected by the Co concentration and microstructure.
