生産加工・工作機械部門講演会 : 生産と加工に関する学術講演会
Online ISSN : 2424-3094
セッションID: 432
会議情報
432 脆性材料の超精密研削(OS12 研削・砥粒加工)
澁谷 秀雄池野 順一不破 徳人堀内 宰鈴木 浩文
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会議録・要旨集 フリー

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Grinding performance of silicon wafer with fine abrasive grinding wheel were investigated. In this study, thin-plate-shaped silica powder, tens μm in length and 1μm in width, were applied as a abrasive for grinding wheel. The grinding wheel were fabricated using a electrophoretic deposition phenomenon, it was called EPD pellet, and thin-plate shaped silica abrasives could be arranged in a one-way direction in the EPD pellet. Grinding effciency of thin-plate shaped silica EPD pellet was twice as high as a conventional EPD pellet which was consist of spherical silica abrasive. Warp of thin-wafer, 150μm in thickness ground by diamond wheel, were decreased with the progress of EPD grinding. This result show that a residual strain by a diamond wheel could be removed by EPD grinding.
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© 2001 一般社団法人 日本機械学会
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