抄録
Micro-fluid devices and optical devices need minute patterns on their surfaces. Recently, the improvement in optical characteristics and chemical-resistance is demanded. Therefore, it is important to make such devices with glass. Minute process of glass is done by photolithography mainly now. But its process is complex and it costs much. Imprint technology has advantages in such sense. But, glass imprint is difficult, because forming temperature is high. In this research, glass imprint with CVD diamond mold is proposed. CVD diamond has advantages in high temperature. FIB process of CVD diamond mold is proposed and the conditions of process are clarified. Imprint of glass is tried by using CVD diamond mold.
