The Proceedings of The Manufacturing & Machine Tool Conference
Online ISSN : 2424-3094
2008.7
Session ID : C08
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C08 Study on surface polishing process using magnetic compound fluid (MCF)
Takashi SATOFumiaki WATANABEYongbo WUWeimin LINKunio SHIMADA
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract
Magnetic compound fluid (MCF) is expected for the use in the ultra-precision surface polishing process of three-dimensional shaped components. The MCF shows the action of accumulation and particle disposition under fluctuating magnetic field, and generates the high restoring force. In this paper, the effects of the MCF composition on the polishing characteristics under fluctuating magnetic field were experimentally investigated. The obtained results showed that the Magnetic Fluid (MF) included in the MCF accelerated the particle disposition once a fluctuating magnetic field is applied, thus generates the high restoring force and increases the polishing performance. The α-cellulose in the MCF not only increased the shearing force but also retain the fluidity, thus improved the polishing performance.
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© 2008 The Japan Society of Mechanical Engineers
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