The Proceedings of The Manufacturing & Machine Tool Conference
Online ISSN : 2424-3094
2016.11
Session ID : B30
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Research on Nano-Stereolithography Using Evanescent Light
-Development of Photo-Curable Resin for Evanescent Light-
Yuki MatsumotoYuki SuzukiMasaki MichihataKiyoshi TakamasuSatoru Takahashi
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Abstract

Micro-fabrication technologies have recently developed dramatically and micro-fabrication methods have become much-needed for devices on the order of micrometer. In particular, the methods are in huge demand that can fabricate MEMS and microscopic optical devices, typified by photonic crystals. In this study, we propose a novel stereolithography method using evanescent light instead of propagating light in order to achieve 100-nanometer vertical resolution. In this report, in order to improve curing controllability of single layered resin exposed by evanescent light, compositions of photocurable resin are experimentally examined. These experiments suggest that standing evanescent wave is useful for evaluating the curing controllability of employed resin, and molecular weight to one functional group in photocurable resin is an important key perameter.

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© 2016 The Japan Society of Mechanical Engineers
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