The Proceedings of The Manufacturing & Machine Tool Conference
Online ISSN : 2424-3094
2016.11
Session ID : D05
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In-process measurement of micro-stereolithography using surface plasmon resonance substrate
Kong DeqingMichihata MasakiTakamasu KiyoshiTakahashi Satoru
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CONFERENCE PROCEEDINGS FREE ACCESS

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Abstract

A surface plasmon resonance measurement has been applied to meet the strong demand for high resolution in-process measurement on Micro-stereolithography. This multi-layer substrate composed by a PLZT layer embedded between two metal thin films, theoretically, can effectively adjust sensitivity depth of phase-detection based surface plasmon resonance by controlling the applied electric voltage on PLZT. In addition PLZT based substrate has been theoretically evaluated. It has been confirmed that a high-resolution detection at arbitrarily refractive index range can be achieved by not only dynamical adjusting incident angle but also a high controlling the applied voltage on PLZT.

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© 2016 The Japan Society of Mechanical Engineers
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