Abstract
Nanometer-scale process utilizing a scanning probe system is a novel technology which can handle tiny patterns. To bring this technology from R&D stage to practical use, drastic improvement of the wear-resistivity of the probe tip is required. The authors have developed a wear-resistant probe ; this consists of a cantilever made from non-doped Si and a metal electrode at the tip having a uniform cross section along its length. The surface of a Si tip and the electrode is on the same plane and these two parts contact simultaneously to the substrate so that the wear-progressive speed becomes slower because of its relatively larger physical contact area while preserving the size of its electric contact area small and constant even after the long distance sliding. Sliding tests of the fabricated probes with various electrode materials are performed by using a contact AFM. In case of the tungsten electrode against the ruthenium substrate, simultaneous mechanical contact of the two different parts together with good electric contact is observed.
