Abstract
It is developed and experimentally demonstrated the novel method of etching metal with ozone-water. Ozone-water was generated by bubbling ozone gas through pure water by absorption effect. Cr was used as a test metal. We evaluated the fundamental performance of etching speed depend on temperature and concentration of ozone. The best etching rate during tested conditions is 27nm/hours at 55℃. The roughness on the surface of both etched with a conventional Cr etchant and the ozone-water. As a result, the ozone-water etched surface (Ra=0.94±0.19) was much smoother than that with conventional etchant (2.61±0.77). While the etching rate is much slower than conventional etchant, enough practical etching rates with atomically flat surface will meet various applications in nanotechnology.
