抄録
Microfabrication technologies have been extensively studied to achieve smaller sizes and higher aspect ratios. When the features have sizes of a couple of micrometers or below, nano-imprinting can be an effective method for microfabrication at low cost. However, it is difficult to achieve aspect ratio greater than 1, which is determined by the mold geometry. In this research, we propose micro fabrication of super absorbent polymer (SAP) as a new material for micro devices. SAP swells by adding DI water, which can be used as a post patterning process to enhance the aspect ratio of micro structures. Micropatterning of SAP must be conducted under thoroughly dry conditions and we used nano-imprinting processes. Figure 1 illustrates the concept of this work. Our ultimate goal is to apply the SAP patterning and swelling processes to microfabricate high-aspect-ratio structures at low cost for high performance lab-on-a-chip
