FIB/EB複合リソグラフィーによるナノ光共振器の作製

抄録

We have proposed a new fabrication process of optical resonator using Focused-ion-beam (FIB)/electron beam(EB) dual-beam lithography, aiming at achieving optical resonators easier. In the process, we used hydrogen silsesquioxane (HSQ) which changes to SiO₂ by high temperature annealing. In addition, FIB/EB dual-beam lithography enables us to fabricate the precise three-dimensional structure as an optical resonator using difference of penetration depth between FIB and EB. In this research, we fabricated an optical resonator structure consisting of Au and HSQ using this method. As a result, fabrication of the optical resonator was achieved by simple and easy process using FIB/EB dual-beam lithography.