マイクロデバイスへの微細加工イオン交換膜の適用

抄録

This paper reports on a micro patterning method of thin Nafion layer which was formed on a device surface. The proposed method enables to fabricate micro size Nafion structure smaller than 100- by using chemical bonding between sulfo group in Nafion and amino-terminal of self assembled monolayer formed on device surface. According to the SPR analysis, we found that the ion absorbing characteristics of the Nafion did not change after our micro pattering method. Thus we confirmed that our method is effective to fabricate Nafion micro structures which are applicable for devices such as fuel cell and or chemical sensors.