静圧軸受を用いたエアステージの高速高精度制御

抄録

Authors have developed the air stage with sufficient accuracy to the semiconductor exposure apparatus by using an air bearing. However, the driving condition was a low speed and low acceleration. In the semiconductor exposure apparatus, it is required to be driven at higher speeds and higher acceleration for productivity. In this study, the air stage drive system with higher speed and higher acceleration is developed using new actuator having bigger pressurized areas, and new servo valves with a larger effective area. As a result, it is found that the performance of maximum speed 1.25 [m/s] and the maximum acceleration 50 [m /s2] will be realized by using the simulation.