抄録
Self-assembled silica nanosphere is proposed as thermal imprint mold instead of conventional mold which is textured by photo-lithography or laser irradiation. Silica nanosphere slurry with 6μm and 500nm in diameter are used and their concentrations are prepared to obtain suitable self-assembled arrangement. The arrangements are then imprinted on PMMA plate with heating and loading. Under proper conditions, the geometries of the arrangements are transferred. The depth and diameter of the transferred pattern are evaluated and they depend on the imprint conditions.
