素材物性学雑誌
Online ISSN : 1884-6610
Print ISSN : 0919-9853
ISSN-L : 0919-9853
MRAM型構造の作製と磁気特性
ロス キャロラインA原谷 進カスターノ フェルナンドJフォゲリ バーンハード住田 成和
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2001 年 14 巻 1-2 号 p. 43-51

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The characteristic points of MRAM are compared with those of DRAM, Flash memory, SRAM, and FeRAM. The differences in PSV-MRAM and MTJ-MRAM are discussed in terms of the directions of sense current, CIP or CPP, and connections of CMOS with MR elements.
An MRAM-type structure was accomplished with three layers of PSV element, NiFe soft layer (6nm) /Cu non-magnetic layer (3-6nm) /Co hard magnetic layer (4nm) on Si-wafer. Each PSV element of 80nm X 150nm was sandwiched by a sense line and a word line at the intersection of these lines. Furthermore, switching phenomena, which were observed in magnetic hysteresis loop by using PSV thin films, are also discussed along with the size limitation of PSV dots.
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