Abstract
In this paper we demonstrate new fabrication process of micro holes using super absorbent polymer (SAP). In recent years, micro meter order processing is enabled by the development of MEMS technology. However, making structures of about 1 pm is difficult while hundreds and tens of nanometer patterning can be done by e-beam lithography and UV lithography is suitable for making patterns greater than several micro meters. So we propose a method to fabricate micro-order-structure by using SAP patterning. In this process, we made a stencil mask of SU-8 for Oxygen-RIE. Using this method, we patterned 5 μm, 10 μm holes. Then SAP was swelled water, the hole diameter shrunk and hole depths of increased. The aspect ratio of holes became about 11 times at 5 μm patterning, and about 14 times at 10 μm patterning after swelling. This fabrication can be applied to micro-TAS and lab-on-a-chip.
