Host: The Japan Society of Mechanical Engineers
Name : [in Japanese]
Date : June 02, 2018 - June 05, 2018
We have developed a two-photon microstereolithography system with autofocus function. In this system, the cured shape of a photocurable resin by irradiating with a femtosecond pulsed laser is observed with an optical microscope, and the position of the substrate is automatically detected from the transmission image of the cured shape. In experiments, during the substrate was sequentially lowered, a cured shape was produced by multiple point exposures. As a result, the substrate was successfully detected with a position accuracy of 250 nm from the difference image of the transmission image whose noise was reduced by an optimal low-pass filter. Unlike the conventional methods, since this method provides autofocus function without additional devices, it is useful for constructing low-cost, compact two-photon microstereolithography apparatus with better usability.
