The Proceedings of JSME annual Conference on Robotics and Mechatronics (Robomec)
Online ISSN : 2424-3124
2021
Session ID : 1A1-J14
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Multi-material Stereolithography Using Photocurable Silica Slurry
*Taiki MARUYAMARyota SATOTaichi FURUKAWAMasaru MUKAIMotoyuki IIJIMAShoji MARUO
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Abstract

In recent years, multi-material stereolithography, which enables the fabrication of highly functional and high-definition 3-dimensional parts, has attracted much attention. However, most of the conventional systems have a problem that it is difficult to use highly viscous materials. In this study, we have improved the cleaning system of our lab-made multi-material stereolithography system using multiple droplets in order to completely clean high viscosity materials. Using this system, we succeeded in making 3D silica structures using highly viscous silica slurry. In addition, we used two types of silica slurries doped with two different metal ions, Eu and Cu, and created a multi-material silica glass structure without material contamination. This method is expected to be applied to various functional devices such as optical and microfluidic devices.

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© 2021 The Japan Society of Mechanical Engineers
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