大気圧プラズマジェットによるOHおよびHラジカルの表面反応挙動の評価

抄録

The wall chemical effect caused by radical adsorption and recombination on the wall surface under flame-wall interaction is investigated by using an atmospheric-pressure non-equilibrium plasma jet (APPJ). To evaluate radical generation in the APPJ, radical chemiluminescence are obtained. It is found that OH and H radicals are successfully formed and issued in open space when water vapor is added into the Argon/Helium APPJ. Then, the OH and H jets are irradiated onto quartz and alumina walls. The reactivity of radical on the quartz wall is decreased with increase in the wall temperature T_w, showing that radical desorption is promoted at higher T_w.