非化学量論組成の酸化ニッケル薄膜の正孔輸送層としての特性評価

抄録

A hole transport layer is one of the main components of a solar cell. It is inserted between the electrode and the storage layer to enable selective charge extraction and to suppress charge recombination at the interface. Nickel oxide is expected to be an inorganic hole transport material with good performance because it has good chemical stability and behaves as a p-type semiconductor in non-stoichiometric compositions. In this study, nickel(II) oxide thin films with non-stoichiometric composition were prepared by controlling the oxygen partial pressure during film deposition using reactive magnetron sputtering, and their properties as hole transport layers were investigated.