2021 年 70 巻 5 号 p. 369-373
This paper reviews a previously reported paper published in the Journal of the Society of Materials Science, Japan (Vol. 68, No.10, pp.733-738(2019)). The original paper describes the specific growth mechanism of metastable oxides using the mist CVD technique, and is of great usefulness for growing them with this technique, which requires relatively low growth temperatures and normal pressures. Metastable oxides have been gaining increasing attention for their unique and excellent physical characteristics. The Mist CVD technique is a key to synthesizing a wide variety of metastable materials efficiently.