Nitrogen Radical Beam Irradiation on InN Film for Surface Modification

抄録

The in situ surface modification of InN films by nitrogen (N) radical beam irradiation was investigated using different substrate temperatures, plasma powers, and irradiation times. The changes in the surface morphology and electrical properties of the irradiated InN templates were studied. It was confirmed that N radical beam irradiation could modify the InN template's surface morphology. Furthermore, a comparison with annealing without N radical beam irradiation revealed that the N radical beam irradiation on the InN template could modify the surface morphology of the template and suppress InN thermal decomposition.