材料
Online ISSN : 1880-7488
Print ISSN : 0514-5163
ISSN-L : 0514-5163
AFM酸化を用いて作製したInAs表面反転層およびInAs/AlGaSb量子井戸ナノスケール開放型ドット中での電子波干渉効果
中島 貴史藤田 隆洋中島 洋二中井 正人前元 利彦佐々 誠彦井上 正崇
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2004 年 53 巻 12 号 p. 1340-1345

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Electron interference effects at 4.2K were studied in nano-scale open dots fabricated in InAs surface inversion layers and in an InAs/AlGaSb quantum well. These structures were fabricated using AFM oxidation. We have observed periodic oscillations and aperiodic fluctuations on both systems. We investigated oscillation period using Fast Fourier Transform analysis. We found that for the InAs surface inversion layers the oscillation periods correspond to that of Aharonov-Bohm effect (AB effect) in agreement with the dot size. In contrast, for the InAs/AlGaSb quantum well, the deduced oscillation period did not correspond to the dot size. These results suggest that the observed AB oscillations are caused by the channel formed along the dot periphery due to the electron transfer from the InAs oxide to the InAs. Aperiodic fluctuations were characterized using correlation field analysis. For InAs/AlGaSb quantum well, correlation field was increased due to smaller skipping radius, as magnetic field increased. For InAs inversion layers, the correlation fields were not changed because the dot size is smaller than the cyclotron radius. The estimated electron phase breaking times tf were 1 psec and 10 psec for the InAs surface inversion layers and quantum well, respectively. The longer tf in InAs than that of GaAs systems at 4.2K indicates the importance of electron interference in InAs even at higher temperatures.
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