Journal of the Japan Society for Precision Engineering, Contributed Papers
Online ISSN : 1881-8722
Print ISSN : 1348-8724
ISSN-L : 1348-8716
Paper
Mechanism of Residual Stress Control in Thin Films by Means of Substrate Vibration
Takamasa SUZUKIAkihito MATSUMUROYutaka TAKAHASHI
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JOURNAL FREE ACCESS

2005 Volume 71 Issue 4 Pages 460-465

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Abstract
A method that controls the residual stress in crystalline films was proposed by vibrating the substrate using a piezo actuator [A. Matsumuro et al., J. Japan Soc. Prec. Eng., Vol.70, No.4, (2004)533]. The mechanism behind the control of the residual stress has not been clarified to date. Here, grain size measurements of the films were taken by XRD, the microstructure by SEM, TEM and AFM and the density of the film by fluorescent X-ray spectroscopy. Independent of substrate vibration, both Ti and TiN films had columnar structure when being prepared by the evaporation technique of electron beam heating, but compressive residual stress turned to tensile upon applying substrate vibration. The grain size decreased and the gap between adjacent crystals at the point of coalescence increased with an increase of vibration amplitude. This is because the decrease in grain size stimulates the development of tensile stress caused by crystallite coalescence while an increasing gap in the columnar structure causes contraction in the film enhancing tensile stress.
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© 2005 by The Japan Society for Precision Engineering
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