Journal of the Japan Society for Precision Engineering, Contributed Papers
Online ISSN : 1881-8722
Print ISSN : 1348-8724
ISSN-L : 1348-8716
Paper
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution
-Realization of Nanofocused Hard X-ray Beam Better than 50nm under Diffraction Limited Condition-
Satoshi MatsuyamaHidekazu MimuraHirokatsu YumotoHideyuki HaraKazuya YamamuraYasuhisa SanoYoshinori NishinoKenji TamasakuMakina YabashiTetsuya IshikawaKazuto Yamauchia
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2006 Volume 72 Issue 7 Pages 884-888

Details
Abstract
To develop hard X-ray microscopy with high spatial resolution, development of focusing optical system is the most important. Kirkpatrick and Baez mirrors are promising focusing devices for X-ray due to their capability of highly efficient and energy-tunable focusing. However, it is difficult to adjust the alignment of two mirrors precisely in a short time because the mirrors have a multi-degree-of-freedom that should be adjusted. To align mirrors precisely and rapidly, relationships between mirror-positioning errors and focal sizes were investigated using two types of simulators: a ray-trace simulator and a wave-optical simulator. On the basis of the results, a mirror manipulator was developed achieving optimum K-B mirrors setup. Using the manipulator, hard-X-ray diffraction- limited focusing was realized with a size less than 50nm at 15keV at 1km long beamline of SPring-8.
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© 2006 The Japan Society for Precision Engineering
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