Journal of Plasma and Fusion Research
Print ISSN : 0918-7928
Special Topic Article : Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research
Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 5.Discharge Produced Plasma Light Sources 5.1Present Status of Discharge Produced Plasma Light Sources Development
Eiki HOTTA
Author information
Keywords: EUV, discharge light source, z-pinch, capillary, plasma focus, hollow cathode, lithography, pulsed power
JOURNAL FREE ACCESS

2003 Volume 79 Issue 3 Pages 245-251

Details
Download PDF (652K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Abstract
The present status of the development of light sources based on discharge for EUV lithography is reviewed. The discharges, such as Z-pinch, capillary discharge, plasma focus and hollow cathode discharge, are compared and their significant features are pointed out. The performance of each type of discharge is summarized.The plans and the present state of the development of EUV high sources at Tokyo Institute of Technology and Kumamoto University are briefly described.
Content from these authors
© 2003 by The Japan Society of Plasma Science and Nuclear Fusion Research
Previous article Next article
Favorites & Alerts

Recently viewed articles
Predecessor

Kakuyūgō kenkyū

Share this page
feedback
 Top