Journal of Plasma and Fusion Research
Print ISSN : 0918-7928
Special Topic Article : Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research
Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 4.Laser Produced Plasma Light Sources 4.2High Average Power Laser Produced Plasma EUV Light Sources
Akira ENDO
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Keywords: EUV, LPP, 13.5nm, Xe, high repetition short pulse laser, microjet
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2003 Volume 79 Issue 3 Pages 240-244

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Abstract
This paper reviews the research and development of the high average power, extreme ultraviolet light source based on laser produced plasma by EUVA. The technology is based on a liquid Xe micro jet, high repetition rate short pulse Nd:YAG laser, and various diagnostics for plasma optimization are described.
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© 2003 by The Japan Society of Plasma Science and Nuclear Fusion Research
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