Present Status and Future of EUV (Extreme Ultra Violet) Light Source Research 6.EUV Light Source Development Project at EUVA and Research Collaboration between Universities and Industry

Abstract

The extreme ultraviolet (EUV) light source development project of the EUVA and the research collaboration between industry and universities are described. The development of EUV light sources using both laser produced plasma and discharge produced plasma is currently under way. The goal of four-year project is to attain 10 W output power at an intermediate focus point which should satisfy all the requirements of the EUV lithography light sources. The collaboration with universities will expand next year under the new research framework of the leading program of laser-based EUV sources.