Kakuyūgō kenkyū
Online ISSN : 1884-9571
Print ISSN : 0451-2375
ISSN-L : 0451-2375
Introductory Remarks : Fundamental Properties and Internal Structure of Processing Plasma
Takayoshi Okuda
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1987 Volume 57 Issue 1 Pages 16-23

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Abstract
A variety of plasma processes are summarized from the point of view of discharge physics. Since low temperature plasmas are widely used, our attention is paid to glow discharge, especially high frequency glow discharge. The basic properties and internal structure are discussed.
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© The Japan Society of Plasma Science and Nuclear Fusion Research
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