Parameter Control of Various Reactive Plasmas for Plasma Processings

Abstract

Modelling of the reactive gas discharge plasma has been carried out. Numerical solutions of the relation between particle densities (various ions and radicals) and discharge conditions (gas pressure, gas mixture ratio and electron density) are presented and discussed. The results show that the radical particle densities are always more than one order of magnitude larger than the ion densities. There is an optimum value in gas pressure and gas mixture ratio for producing the free radicals.