プラズマプロセス
低温プラズマによる薄膜合成と表面改質
1992 年 68 巻 6 号 p. 577-585
詳細
1992 年 68 巻 6 号 p. 577-585
Plasma processing including ion processing is reviewed. The advantage of plasma processing, compared with usual thermal processing, is described.In the plasma processing, the plasma-surface interaction for thin film formation is addressed as a key issue.As the example of plasma processing, carbonization experiments based on plasma CVD and nitridation experiments using ECR plasma are briefly introduced.
