Journal of Smart Processing
Online ISSN : 2187-1337
Print ISSN : 2186-702X
ISSN-L : 2186-702X
Control of Ge Nanoporous Films by Using High-Pressure Plasma Sputtering and Their Application for Li Ion Batteries
Giichiro UCHIDA
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2024 Volume 13 Issue 1 Pages 13-17

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Abstract
  We fabricated nanostructured Ge films using Ar and He radio-frequency magnetron plasma sputtering deposition. Monodisperse amorphous Ge nanoparticles of 30-50 nm size were arranged without aggregation in the high-gas-pressure range of 500 Torr. The Ge film porosity was as high as 15-30%. We tested the charge/discharge cycle performance of Li-ion batteries with nanostructured Ge and GeSn anodes. The Ge anode with a dispersed arrangement of nanoparticles showed a Li-storage capacity of 565 mAh/g after the 60th cycle. The capacity retention was markedly improved by the addition of 3 at% Sn in Ge anode. The GeSn anode (3 at% Sn) achieved a higher capacity of 1128 mAh/g after 60 cycles with 92% capacity retention. Precise control of the nano-morphology by a single step procedure using low temperature plasma is effective for stable cycling of high-capacity Ge anodes.
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© 2024 Smart Processing Society for Materials, Environment & Energy
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