Visible Light-Sensitive Photopolymer based on Cationic Polymerization of Epoxide

Abstract

Described in this study are characteristics of new photopolymer designed specifically for ring-opening polymerization of epoxide monomers in thin polymer film. The result reveals that these materials undergoes a marked change in solubility following exposure to 254 nm and can function as a negative type photoresist. Experiments designed to elucidate the photochemical and thermal reactions occurring in the films are described and the preliminary evaluation of lithographic properties is presented.