Atomic Scale Surface Control of Metal Oxide Substrates towards Perfect Epitaxy

Abstract

An overview of the current attention to the oxide epitaxy is given to emphasize the importance of atomic scale control of oxide substrate surfaces. Examples of the ways to define the surfaces are presented. A detailed study on SrTiO₃ substrate surfaces, including surface dynamics during wet etching and high temperature annealing is presented in real space in order to show the state of the arts for regulation of oxide substrate surface towards perfect epitaxy of oxide heterostructures.