Organic Thin Film Deposition by Glow Discharge Process

RF Sputtering

Abstract

Organic thin film deposition by plasma sputtering has almost not been investigated except for polytetrafluoroethylene. Recently, polyimide and other polymers have been sputtered by several workers. The molecular structure of the sputtered polyimide film was much different from that of the target. No imide group existed in the film. Active N₂ gas added to Ar gas participated in the decomposition and polymerizing reaction during sputtering. N content in the film increased by reactive sputtering. The sputtered polyimide films showed excellent properties as ultra thin solid lubricating film and heat resistant film. The sputtered polycarbonate film and the cosputtered Ekonolmetal film are of interest for basic and technical applications such as photo-senser, electrical shielding and optical filters. History and recent studies of organic film deposition by sputtering have been reviewed.