Abstract
Recent semiconductor industries have come to require ultra-clean spaces as production environments where the cleanliness level is strictly limited to less than 10 particulates of 0.1μm and larger per 1 ft 3 . In order to create and maintain such clean spaces, we should control not only the density but also the individual behavior of such fine particulate, which are expected to coincide with the airflow.
In this report, we visualized the airflow pattein in a model clean room by injecting the tobacco smoke through nozzles into the upstream of the linear flow with outlet velocities of 15 to 45 cm/s. We took pictures of airflow patterns including disturbance due to the presence of the static and the moving objects. We discussed some basic patterns in comparison with the numerical results of solving the two-dimensional Navier-Stokes equation. An 8mm film of the airflow patterns will also be shown at this Symposium.
